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Simulation of Thermal Effects on Hydrogen-Terminated Diamond MOSFETs

机译:氢封端金刚石MOSFET的热效应模拟

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The DC characteristics of hydrogen-terminated diamond (HTD) MOSFETs are simulated in the temperature range from 140 to 500K. The temperature-dependent parameters, such as band gap width, intrinsic/extrinsic carrier density, hole mobility and hole saturation velocity, are calculated and compared with measured data. The simulated output/transfer characteristics show good agreement with experiments, and the maximum drain current shows smaller thermal variation than the low-field mobility does, which is due to the existence of transverse field during device operation. In addition, the pinch-off voltage is found to change linearly with temperature and the temperature coefficient is as small as 0.26mV/K. The thermodynamic simulation reveals that for HTD MOSFETs, the lattice temperature will increase only 30K when the device is operated at a current density as high as 1A/mm.
机译:氢封端金刚石(HTD)MOSFET的DC特性在140至500k的温度范围内模拟。将温度依赖性参数,例如带隙宽度,内在/外部载流子密度,空穴迁移率和空穴饱和速度,与测量数据进行比较。模拟输出/转移特性与实验表现出良好的一致性,并且最大漏极电流显示比低场移动性较小的热变化,这是由于在器件操作期间存在横向场。另外,发现挤出电压随温度而线性变化,温度系数小于0.26mV / k。热力学仿真显示,对于HTD MOSFET,当器件以高达1A / mm的电流密度操作时,晶格温度将仅增加30K。

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