Repetitive operation of counter-facing plasma focus device: toward a practical light source for EUV lithography

摘要

In this paper, the latest advances in the field of extreme ultra violet (EUV) light sources for application in counter-facing plasma focus devices are presented. EUV emission, plasma and electrical properties under two pulses operation are reported. Using this new plasma focus system, the total amount of supply material and the energy cost of the plasma source could be reduced. The physical behavior during a two-pulse experiment with a high repetition rate (1 kHz) is explained. Continuous operation for future practical use in advanced lithography systems is also investigated.