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Physics-based modeling of gate-leakage current in AlGaN/GaN high electron mobility transistors

机译:基于物理的AlGaN / GaN高电子迁移率晶体管中栅漏电流建模

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Gate-leakage currents AlGaN/GaN high electron mobility transistors (HEMTs) have been studied. The reverse bias gate-leakage current is decomposed into three dominant components, namely, Fowler-Nordheim tunneling, trap-assisted-tunneling, and trap-assisted Frenkel-Poole emission. A physics-based model to calculate this current is given, which follows the experimental gate-leakage current characteristics closely over a wide range of bias and temperature.
机译:已经研究了栅极漏电流AlGaN / GaN高电子迁移率晶体管(HEMT)。反向偏置栅极漏电流被分解为三个主要成分,即Fowler-Nordheim隧穿,陷阱辅助隧道和陷阱辅助Frenkel-Poole发射。给出了一个基于物理的模型来计算该电流,该模型在很宽的偏置和温度范围内紧密遵循实验的栅极漏电流特性。

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