首页> 外文会议>International Conference on Nitride Semiconductors(ICNS-5); 20030525-20030530; Nara; JP >Characterization of GaN based Schottky UV detectors in the vacuum UV (VUV) and the soft X-ray (SX) region (10-100 nm)
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Characterization of GaN based Schottky UV detectors in the vacuum UV (VUV) and the soft X-ray (SX) region (10-100 nm)

机译:在真空UV(VUV)和软X射线(SX)区域(10-100 nm)中表征基于GaN的肖特基UV检测器

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摘要

Responsivity spectra of GaN based Schottky type ultraviolet (UV) photodetectors with transparent electrode from the Vacuum Ultraviolet (VUV) region to soft X-ray (SX) region (10-100 nm, 124-12.4 eV) are described for the first time. The calculated transmittance of 10 nm-thick transparent Ni/Au electrode from the transmittance of Ti/Au membrane is about 0.5-0.7 in the VUV and SX region (10-100 eV). Thus it is considered that the 10-nm-transparent Ni/Au electrode is thin enough to transmit VUV and SX light into the transparent electrode. The value of responsivity in the SX region (at 13 nm) is about 0.05 A/W.
机译:首次描述了具有透明电极的GaN基肖特基型紫外线(UV)光探测器从真空紫外线(VUV)区域到软X射线(SX)区域(10-100 nm,124-12.4 eV)的响应光谱。根据Ti / Au膜的透射率,在VUV和SX区域(10-100 eV)中计算出的10 nm厚的透明Ni / Au电极的透射率约为0.5-0.7。因此,认为10nm透明的Ni / Au电极足够薄以将VUV和SX光透射到透明电极中。 SX区域(在13 nm处)的响应度值约为0.05 A / W。

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