首页> 外文会议>International Conference on Nitride Semiconductors(ICNS-5); 20030525-20030530; Nara; JP >336 nm ultraviolet LEDs grown with AlN interlayers for strain reduction
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336 nm ultraviolet LEDs grown with AlN interlayers for strain reduction

机译:使用AlN中间层生长的336 nm紫外线LED用于降低应变

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UV LEDs with a peak emission wavelength of 336 nm were grown on a gallium nitride/sapphire substrate by inserting an AlN interlayer to prevent cracking. A maximum output power of 44 μW was achieved at 100 mA DC for 200 x 200 μm die wirebonded to a header and encapsulated in epoxy. The maximum output power increased to 0.367 mW at 537 mA when tested under pulsed conditions. Lateral current crowding and device self-heating are observed to be the major factors limiting output power. We have shown that epoxy packaging traditionally used for InGaN based LEDs has strong absorption at these wavelengths and will not be suitable for deep UV LEDs.
机译:通过插入AlN中间层以防止破裂,在氮化镓/蓝宝石衬底上生长峰值发射波长为336 nm的UV LED。对于200 x 200μm引线键合到接头并封装在环氧树脂中的管芯,在100 mA DC时实现了44μW的最大输出功率。在脉冲条件下测试时,最大输出功率在537 mA下增加到0.367 mW。观察到横向电流拥挤和设备自发热是限制输出功率的主要因素。我们已经表明,传统上用于基于InGaN的LED的环氧树脂封装在这些波长下具有很强的吸收能力,因此不适合深紫外LED。

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