Department of Electrical Engineering, Solid State Institute and Microelectronic Center, TECHNION, The Israel Institute of Technology, Haifa 32000, Israel;
thin film structure and morphology; III-V semiconductors; theory and models of crystal growth; physics of crystal growth, crystal morphology and orientation; chemical vapor deposition (including plasma-enhanced CVD, MOCVD, etc.);
机译:通过活性气体交换技术制备低氧含量的AlN粉末粉末
机译:石墨碳封闭AlN纳米颗粒,具有增强的甲醇耐受电催化性能用于氧还原
机译:石墨碳封闭AlN纳米颗粒,具有增强的甲醇耐受电催化性能用于氧还原
机译:ALN中的氧气污染减少
机译:研究含有氧-氧或硫-氧键的有机分子的解离电子转移还原的机理。
机译:含氧ALN / 4H-SIC异质结二极管的制备和表征
机译:碱性直接甲醇燃料电池新出现的甲醇耐受ALN纳米线氧还原电催化剂