首页> 外文会议>International Conference on Nitride Semiconductors(ICNS-5); 20030525-20030530; Nara; JP >Improvement in the luminescence efficiency of GaAsN alloys by photoexcitation
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Improvement in the luminescence efficiency of GaAsN alloys by photoexcitation

机译:通过光激发提高GaAsN合金的发光效率

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We found that photoexcitation with high excitation power density at low temperatures improves the luminescence efficiency of GaAsN alloys. From the temporal change of the PL intensity, the improvement occurs in a few minutes. Micro Raman study shows that structural changes occur in the laser-irradiated region. These indicate that the improvement of luminescence properties is due to photoexcitation-induced local structural changes. Since no distinct PL peak shift was observed after the laser irradiation at low temperatures, photoexcitation is a useful technique to improve the luminescence efficiency only.
机译:我们发现,在低温下以高激发功率密度进行光激发可以提高GaAsN合金的发光效率。从PL强度的时间变化来看,这种改善会在几分钟内发生。 Micro Raman研究表明,结构变化发生在激光照射区域。这些表明发光性能的改善是由于光激发引起的局部结构变化。由于在低温下进行激光照射后未观察到明显的PL峰位移,因此光激发是仅用于提高发光效率的有用技术。

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