首页> 外文会议>International Conference on Defects in Semiconductors; 20050724-29; Awaji Island(JP) >Shallow bistable non-effective-mass-like donors in hydrogen-implanted silicon
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Shallow bistable non-effective-mass-like donors in hydrogen-implanted silicon

机译:氢注入硅中的浅双稳态非有效质量样供体

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Infrared absorption of float-zone-refined silicon crystals implanted with protons and annealed at 450 ℃ has been investigated in the range 150-1800 cm~(-1). Along with the presence of well-known prominent bands related to higher-order electronic transitions of intrinsic defects at 700-1200 cm~(-1) and wagging vibrations of Si-H bonds in 600-800 cm~(-1) range, four effective-mass-like donors with binding energies in the range 32.6-38.7meV and dominating sharp absorption peaks at 309, 373 and 444 cm~(-1) were observed. The dominant sharp peaks as well as a broad band in the spectral region 200-1800cm~(-1) with the maximum at ~ 450 cm~(-1) demonstrate bistable behavior and arise from hydrogen-related non-effective-mass-like shallow donors.
机译:在150-1800 cm〜(-1)范围内研究了注入质子并在450℃退火的浮区精制硅晶体的红外吸收。以及与700-1200 cm〜(-1)的固有缺陷的高阶电子跃迁和600-800 cm〜(-1)范围内的Si-H键的摆动振动相关的著名显带的存在,观察到四个有效质量的供体,其结合能在32.6-38.7meV范围内,在309、373和444 cm〜(-1)处有明显的吸收峰。光谱区200-1800cm〜(-1)内的主要尖峰和宽带峰在〜450 cm〜(-1)处表现出最大的双稳态,表现为与氢有关的非有效质量态。浅层供体。

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