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Native defects in In_xGa_(1-x)N alloys

机译:In_xGa_(1-x)N合金中的固有缺陷

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To elucidate the role of native defects in determining the electronic and optical properties of In_(1-x)Ga_xN, energetic particle irradiation (electrons, protons, and ~4He~+) has been used to intentionally introduce point defects into In_xGa_(1-x)N alloys. Optical absorption, Hall effect, and capacitance-voltage (CV) measurements are used to evaluate properties of these materials. Irradiation produces donor-like defects in In_xGa_(1-x)N with x > 0.34, while acceptor-like defects form in Ga-rich In_xGa_(1-x)N (x < 0.34). A sufficiently high irradiation dose pins the Fermi level at the Fermi level stabilization energy (E_(FS)), as predicted by the amphoteric defect model. Pinning of the Fermi level at this energy is also responsible for the surface electron accumulation effect in unirradiated In-rich In_(1-x)Ga_xN.
机译:为了阐明固有缺陷在确定In_(1-x)Ga_xN的电子和光学性质中的作用,已使用高能粒子辐照(电子,质子和〜4He〜+)故意将点缺陷引入In_xGa_(1- x)N合金。使用光吸收,霍尔效应和电容电压(CV)测量来评估这些材料的性能。辐照会在In> xGa_(1-x)N中产生供体样缺陷,且x> 0.34,而在富含Ga的In_xGa_(1-x)N中会形成供体样缺陷(x <0.34)。如两性缺陷模型所预测的,足够高的辐射剂量将费米能级固定在费米能级稳定能(E_(FS))处。在此能量下费米能级的钉扎还负责未辐照的富In_(1-x)Ga_xN中的表面电子积累效应。

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