Plasma Based Ion Implantation System Based on the Combination of RF and Pulsed High Voltage

摘要

We have developed a coating technique combining plasma generated by RF power and high voltage pulsed ion implantation; RF and high voltage pulses are added simultaneously to specimens through one feed-through. Both burst and continuous R.F operating modes can be utilized in this system. The features of the combined technique are: 1) efficient usage of plasma because transportation of plasma to the specimens is not needed, 2) uniform distribution of implanted ions, 3) simplification of plasma based ion implantation (PBII) apparatus. Some examples of uses of this technique are nitridation of Ti with applications as TiN coating and diamond-like carbon (DLC) coatings of aluminum surface.