首页> 外国专利> Members for mask production, masks, and methods thereof for manufacturing same

Members for mask production, masks, and methods thereof for manufacturing same

机译:口罩生产用部件,口罩及其制造方法

摘要

Substrates are disclosed for forming a microlithographic mask having a thin membrane. Also disclosed are masks formed from such substrates. The masks preferably include a support member to support the membrane, the membrane defining the mask pattern. The support member can be configured as a network of supporting struts fused to a mask membrane. The mask membrane preferably includes a thin crystalline layer (e.g., silicon) containing an impurity (dopant). Each atom of the impurity has an atomic radius that is smaller than the atomic radius of atoms of the crystalline material. Also disclosed are methods for manufacturing such substrates and masks.
机译:公开了用于形成具有薄膜的微光刻掩模的基板。还公开了由这种基板形成的掩模。掩模优选地包括用于支撑膜的支撑构件,该膜限定掩模图案。支撑构件可以被配置为融合到面膜上的支撑杆的网络。掩模膜优选包括含有杂质(掺杂剂)的薄结晶层(例如,硅)。杂质的每个原子的原子半径小于晶体材料的原子的原子半径。还公开了用于制造这种基板和掩模的方法。

著录项

  • 公开/公告号US6168890B1

    专利类型

  • 公开/公告日2001-01-02

    原文格式PDF

  • 申请/专利权人 NIKON CORPORATION;

    申请/专利号US19980204624

  • 发明设计人 SHINICHI TAKAHASHI;

    申请日1998-12-01

  • 分类号G03F90/00;G03C50/00;

  • 国家 US

  • 入库时间 2022-08-22 01:05:55

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号