Production method for exposure mask defect inspection method of the mask blank glass substrate, mask blank glass substrate, mask blank, exposure mask, mask blank manufacturing method for glass substrate, and method of manufacturing mask blank

摘要

PROBLEM TO BE SOLVED: To improve the pattern transfer precision by detecting inner defects substantially all over the areas of a glass substrate including inner defects near the main surface largely affecting the pattern transfer to other objects.;SOLUTION: It has a preparation step of preparing a composite quartz substrate 4 having an end surface 2 to input short wavelength light of 200 nm or less, and a checking step of introducing the short wavelength light from the end surface 2 and receiving through the other end surface the light emitted by the inner defects of the glass substrate in a wavelength longer than the above short wavelength light to find inner defects. When manufacturing a mask blank glass substrate from a composite quartz substrate free from the inner defects as found in the checking step, it prepares a composite quartz substrate 4 which has a small chamfer 51 made on the end surface 2 with the width t smaller than the width T of the chamfers 53, 57 on the end surface 18 facing this end surface in the above preparation step, and introduces the above short wavelength light to the side surface 59 of the end surface 2 in the above checking step.;COPYRIGHT: (C)2007,JPO&INPIT