PHOTOMASK, PATTERN FORMING METHOD USING THE SAME AND METHOD FOR FORMING MASK DATA TO IMPROVE DEFOCUS CHARACTERISTIC AND CHARACTERISTIC

摘要

PURPOSE: A photomask is provided to improve a defocus characteristic in transcribing a main pattern due to diffraction light generated by a sub pattern for diffracting exposure light by disposing the sub pattern on a photomask apart from the main pattern. CONSTITUTION: A photomask includes a mask pattern formed on a transmission substrate(100) and a light transmitting part without the mask pattern in the transmission substrate. The mask pattern includes a main pattern(101) transcribed by exposure and a sub pattern(102) that diffracts exposure light and is not transcribed by exposure. The first half light shielding part(101A) has the first transmissivity partially transmitting the exposure light and transmits the exposure light of the same phase with reference to the light transmitting part. A phase shifter(101B) transmits the exposure light of an opposite phase with reference to the light transmitting part. The main pattern includes the first half light shielding part and the phase shifter. The sub pattern is composed of the second half light shielding part that has the second transmissivity partially transmitting the exposure light and transmits the exposure of the same phase with reference to the light transmitting part.