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GaSb-BASED PHASE-CHANGE RECORDING FILM WITH HIGH CRYSTALLIZATION SPEED, AND SPUTTERING TARGET FOR FORMING IT
GaSb-BASED PHASE-CHANGE RECORDING FILM WITH HIGH CRYSTALLIZATION SPEED, AND SPUTTERING TARGET FOR FORMING IT
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机译:基于GaSb的具有高结晶速度的相变记录膜以及形成它的溅射靶
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摘要
PROBLEM TO BE SOLVED: To provide a GaSb-based phase-change recording film with a high crystallization speed, and a sputtering target for forming it.;SOLUTION: In the GaSb-based phase-change recording film with the high crystallization speed, 8-14at.% Ga and 13-16at.% Pb are contained, and the rest has a composition composed of Sb and unavoidable impurities. The target is used for forming the GaSb-based phase-change recording film by sputtering.;COPYRIGHT: (C)2005,JPO&NCIPI
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