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GaSb-BASED PHASE-CHANGE RECORDING FILM WITH HIGH CRYSTALLIZATION SPEED, AND SPUTTERING TARGET FOR FORMING IT

机译:基于GaSb的具有高结晶速度的相变记录膜以及形成它的溅射靶

摘要

PROBLEM TO BE SOLVED: To provide a GaSb-based phase-change recording film with a high crystallization speed, and a sputtering target for forming it.;SOLUTION: In the GaSb-based phase-change recording film with the high crystallization speed, 8-14at.% Ga and 13-16at.% Pb are contained, and the rest has a composition composed of Sb and unavoidable impurities. The target is used for forming the GaSb-based phase-change recording film by sputtering.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:提供一种具有高结晶速度的基于GaSb的相变记录膜,以及用于形成该靶的溅射靶;解决方案:在具有高结晶速度的基于GaSb的相变记录膜中,8含有-14at。%的Ga和13-16at。%的Pb,其余的组成由Sb和不可避免的杂质组成。该靶材用于通过溅射形成基于GaSb的相变记录膜。版权所有:(C)2005,JPO&NCIPI

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