首页> 外国专利> GaSb-BASED PHASE CHANGING TYPE RECORDING FILM WITH LOW MELTING POINT AND LOW CRYSTALLIZATION TEMPERATURE AND SPUTTERING TARGET FOR FORMING THE GaSb-BASED PHASE CHANGING TYPE RECORDING FILM

GaSb-BASED PHASE CHANGING TYPE RECORDING FILM WITH LOW MELTING POINT AND LOW CRYSTALLIZATION TEMPERATURE AND SPUTTERING TARGET FOR FORMING THE GaSb-BASED PHASE CHANGING TYPE RECORDING FILM

机译:低熔点低结晶温度和溅射靶的基于GaSb的相变型记录膜,用于形成基于Gasb的相变型记录膜

摘要

PROBLEM TO BE SOLVED: To provide a GaSb-based phase changing type recording film with a low melting point and a low crystallization temperature and a sputtering target for forming the GaSb-based phase changing type recording film.;SOLUTION: The GaSb-based phase changing type recording film with a low melting point comprising an Sb-based alloy comprising 5-20% Ga in terms of atomic%, in addition, less than 5 to 20% In, and remaining part being Sb and inevitable impurities, and the target for forming the GaSb-based phase changing type recording film by sputtering, are provided.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:提供具有低熔点和低结晶温度的基于GaSb的相变型记录膜以及用于形成基于GaSb的相变型记录膜的溅射靶。解决方案:基于GaSb的相具有低熔点的变型记录膜,其包含Sb-基合金,该Sb-基合金包含5-20%Ga(按原子%计),此外,In含量小于5至<20%,其余部分为Sb和不可避免的杂质,提供了一种通过溅射形成GaSb基相变型记录膜的靶材。版权所有:(C)2005,日本特许厅

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