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Putting the active

机译:积极投入

摘要

PURPOSE: To enable a semiconductor laser element to be protected against COD and enhanced in output power by a method wherein a current non-injection region on an active layer adjacent to a projection end face of a double hetero structure cleaved in the lengthwise direction of a resonator and a semiconductor layer larger than the active layer in band gap are provided. ;CONSTITUTION: An n-GaAs buffer layer 2, an n-AlGaAs lower clad layer 3, a GaAs lower light confinement layer 4, an active layer 5, a GaAs upper light trapping layer 6, a P-AlGaAs upper clad layer 7, and a P++-GaAs cap layer 8 are successively laminated on an n-GaAs substrate 1. The cap layer 8 and the upper clad layer 7 are etched for the formation of a ridge mesa, a part of the cap layer 8 on the top of the ridge mesa is removed as long as the length of a resonator so as to serve as a current non-injection region 8a, and an SiOx layer 9, an electrode contact window 9a, and an AlOx layer 10 are formed. Therefore, when an InGaP layer 11 larger in band gap than the active layer 5 is grown on a cleavage end face, a semiconductor laser element high in power output and reliability can be obtained preventing COD.;COPYRIGHT: (C)1997,JPO
机译:目的:通过一种方法使半导体激光元件免受COD的影响并提高输出功率,该方法中,与双异质结构的投影端面相邻的有源层上的电流非注入区沿a的长度方向裂开。设置了谐振器和带隙大于有源层的半导体层。组成:n-GaAs缓冲层2,n-AlGaAs下部覆盖层3,GaAs下部光限制层4,有源层5,GaAs上部光捕获层6,P-AlGaAs上部覆盖层7,然后,在n-GaAs衬底1上依次层叠有P ++ -GaAs覆盖层8。对覆盖层8和上部覆盖层7进行蚀刻,以形成脊台面。只要谐振器的长度被用作电流非注入区域8a,就去除在脊台面顶部上的覆盖层8的一部分,并且SiO x 层9,形成电极接触窗9a,并形成AlO x 层10。因此,当在裂隙端面上生长出带隙大于活性层5的InGaP层11时,可以获得防止COD的高功率输出和可靠性的半导体激光元件。版权所有:(C)1997,JPO

著录项

  • 公开/公告号JP3717206B2

    专利类型

  • 公开/公告日2005-11-16

    原文格式PDF

  • 申请/专利权人 古河電気工業株式会社;

    申请/专利号JP19950163817

  • 发明设计人 大久保 典雄;

    申请日1995-06-29

  • 分类号H01S5/028;

  • 国家 JP

  • 入库时间 2022-08-21 21:49:08

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