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Method for improving low-K dielectrics by supercritical fluid treatments
Method for improving low-K dielectrics by supercritical fluid treatments
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机译:通过超临界流体处理改善低介电常数的方法
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摘要
A method for treating an inter-metal dielectric (IMD) layer to improve a mechanical strength and/or repair plasma etching damage including providing a low-K silicon oxide containing dielectric insulating layer; and carrying out a super critical fluid treatment of the low-K dielectric insulating layer including supercritical CO2 and a solvent including a silicon bond forming substituent having a bonding energy greater than a Si—H to replace at least a portion of the Si—H bonds with the silicon bond forming substituent.
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