首页> 外国专利> Method and apparatus for probing at arbitrary locations within an inaccessible array of leads the solder balls or pins actually connecting a VLSI IC package to a substrate or socket

Method and apparatus for probing at arbitrary locations within an inaccessible array of leads the solder balls or pins actually connecting a VLSI IC package to a substrate or socket

机译:用于在难以接近的引线阵列中的任意位置进行探测的方法和设备,这些焊球或引脚实际上将VLSI IC封装连接到基板或插座

摘要

A probe for an array of interconnecting leads between a PCA and an IC has one or more contacts extending laterally from or plated upon one or more arms formed of a flexible printed circuit, and connected by traces along the arm(s) to a header that itself affords connection to measurement equipment. The flexible printed circuit is thin enough to loosely slide between the top of the PCA or PCB and the bottom of the IC. The arm or arms is/are narrow enough to slide between the adjacent leads forming the array, while the normally flat contacts will successively interfere with, to engage and electrically contact, consecutive layers of leads as the probe is progressively inserted. An arm is not so stiff that it cannot yield by a slight compressive warping as the contacts encounter leads. Indexing may be ‘by feel’ or by visible indicia along a top surface of the probe or by a reticle device that moves over the top of the IC, which then has a pattern of indicia corresponding to lead location. Forming the shape of a Kapton substrate may also include use of a CVL operating in the range of 250 nm to 290 nm for the creation of extended copper contacts by the removal of underlying Kapton. Plating processes may also be used in the fabrication of (non-extended) wrap-around contacts at the edges of the Kapton.
机译:一种用于PCA和IC之间的互连引线阵列的探针,具有一个或多个触点,该触点从一个或多个由柔性印刷电路形成的臂上横向延伸或镀在其上,并通过沿着臂的走线连接到插头,插头本身可以连接到测量设备。柔性印刷电路足够薄,可以在PCA或PCB的顶部和IC的底部之间轻松滑动。一个或多个臂足够窄以在形成阵列的相邻引线之间滑动,而当探针被逐渐插入时,正常平坦的触点将相继干扰,接合和电接触连续的引线层。手臂不是那么僵硬,以至于在接触导线时,它不会因轻微的压缩翘曲而屈服。分度可以是“感觉”的,也可以是沿探针顶面的可见标记,也可以是在IC上方移动的标线装置,其标线图案对应于引线位置。形成Kapton衬底的形状还可包括使用在250nm至290nm范围内操作的CVL,以通过去除下面的Kapton来产生扩展的铜触点。电镀工艺也可用于制造Kapton边缘的(未扩展)环绕触点。

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