LITHOGRAPHY DEVICE, METHOD OF COMPENSATING SUBSTRATE NON-FLATNESS, METHOD OF FINDING INFLUENCE OF PATTERNING DEVICE NON-FLATNESS, AND METHOD OF FINDING INFLUENCE OF THERMAL LOAD TO PATTERNING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a lithography device, a method of compensating substrate non-flatness, a method of finding influence of patterning device non-flatness, and a method of finding influence of thermal load to a patterning device.;SOLUTION: The lithography device includes a lighting system configured to adjust a radiation beam; a support constructed to support a patterning device capable of forming a patterned radiation beam by giving a pattern in a radiation beam section, a substrate table constructed to retain a substrate; a projection system configured to project the patterned radiation beam on a target portion of the substrate; and a sensor configured to measure a height level, curvature, and/or angle of the surface of the patterning device supported on the support.;COPYRIGHT: (C)2010,JPO&INPIT