SURFACE TREATMENT APPARATUS AND METHOD FOR SURFACE TREATMENT OF PATTERNING DEVICES AND OTHER SUBSTRATES

摘要

Disclosed is a surface treatment apparatus and method for surface trcatmenl of substrates such as wafers or substrates. The surface treatment apparatus comprises one or more support structures for supporting one or more substrates and one or more ultraviolet illumination sources configured to emit ultraviolet illumination, and being operable to treat said at least one surface of said one or more substrates while said one or more substrates being supported by said one or more support structures. The one or more ultraviolet illumination sources arc distinct from an exposure source and not operable to emit exposure illumination for exposing a pattern on a wafer.