首页> 外国专利> Method for manufacturing e.g. microfilter unit, that is utilized for filtering e.g. medium in food product application, involves separating filter layers by etching processes such as wet-chemical or dry-chemical etching processes

Method for manufacturing e.g. microfilter unit, that is utilized for filtering e.g. medium in food product application, involves separating filter layers by etching processes such as wet-chemical or dry-chemical etching processes

机译:制造方法例如微过滤器单元,用于过滤例如食品应用中的介质,涉及通过蚀刻工艺(例如湿化学或干化学蚀刻工艺)分离滤层

摘要

The method involves providing a substrate (10) i.e. silicon wafer, and providing a functional area with a function layer that is formed as filter layers with multiple pores or holes, where the filter layers are stacked one above the other and designed as microfilter layers or nano-filter layers. The filter layers of the substrate are separated by multiple etching processes such as wet-chemical etching processes or drying-chemical etching processes. A sacrificial layer (12) is provided between the substrate and the function layer. The substrate, the sacrificial layer and/or the function layer are made of ceramic, glass, metal, metal alloy or polymer. An independent claim is also included for a filter unit comprising two filter layers.
机译:该方法包括提供衬底(10)即硅晶片,并提供具有功能层的功能区域,该功能层形成为具有多个孔或孔的过滤层,其中过滤层彼此堆叠并设计为微过滤层或微过滤层。纳米过滤层。基板的过滤层通过多种蚀刻工艺例如湿化学蚀刻工艺或干化学蚀刻工艺来分离。在基板和功能层之间设置有牺牲层(12)。衬底,牺牲层和/或功能层由陶瓷,玻璃,金属,金属合金或聚合物制成。对于包括两个过滤层的过滤单元也包括独立权利要求。

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