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Nanofabrication using dip pen nanolithography and metal oxide chemical vapor deposition
Nanofabrication using dip pen nanolithography and metal oxide chemical vapor deposition
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机译:使用浸笔纳米光刻和金属氧化物化学气相沉积的纳米加工
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摘要
Fabrication of a semiconductor structure is achieved by using a Dip Pen Nanolithography (DPN) tip to apply a metal catalyst to a prepared substrate. The catalyst is applied in a predetermined pattern, and crystal growth is established at the catalyst site.
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