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Etching solution of titanium-based metals, tungsten-based metals, titanium tungsten-based metals or their nitrides

机译:钛基金属,钨基金属,钛钨基金属或其氮化物的蚀刻溶液

摘要

Containing hydrogen peroxide water, and organic acid salts, it is etchant titanium-based metals, tungsten-based metals and their nitrides, or titanium-tungsten-based metals. By using this, a uniform etching of titanium-based metal with reduced foaming, tungsten-based metals, of their nitrides or titanium-tungsten-based metals are possible, titanium-based metals, tungsten-based metals, titanium tungsten-based metals I obtained an etching solution with excellent selective etching properties to the substrate material or other metals.
机译:它包含过氧化氢水和有机酸盐,是腐蚀剂,钛基金属,钨基金属及其氮化物或钛钨基金属。通过这种方式,可以均匀地蚀刻泡沫减少的钛基金属,钨基金属,其氮化物或钛钨基金属,钛基金属,钨基金属,钛钨基金属I获得了对基材或其他金属具有优异的选择性蚀刻性能的蚀刻溶液。

著录项

  • 公开/公告号JP5523325B2

    专利类型

  • 公开/公告日2014-06-18

    原文格式PDF

  • 申请/专利权人 昭和電工株式会社;

    申请/专利号JP20100528706

  • 发明设计人 斉藤 康夫;佐藤 浩之介;

    申请日2009-08-25

  • 分类号C23F1/26;H01L21/308;

  • 国家 JP

  • 入库时间 2022-08-21 16:16:39

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