首页>
外国专利>
The resist application device, application development unit, and the resist membrane formation method of having this, being the resist application device which forms the program
The resist application device, application development unit, and the resist membrane formation method of having this, being the resist application device which forms the program
展开▼
机译:作为形成程序的抗蚀剂涂布装置,其是抗蚀剂涂布装置,涂布显影单元以及具有该抗蚀剂膜的形成方法。
展开▼
页面导航
摘要
著录项
相似文献
摘要
PROBLEM TO BE SOLVED: To provide a resist coating apparatus and a resist film forming method capable of forming a color resist film, having high film thickness uniformity, on a substrate.;SOLUTION: The resist coating apparatus includes: a substrate temperature regulation section composed to regulate the temperature of the substrate so that the temperature in the periphery of the substrate is higher than the temperature in the center part of the substrate; a color resist liquid supply section which supplies a color resist liquid on the substrate temperature-regulated by the substrate temperature regulation section so that a temperature becomes higher in the periphery than the center part; and a substrate rotating section which rotates the substrate to which the color resist liquid is supplied.;COPYRIGHT: (C)2012,JPO&INPIT
展开▼