RESIST APPLICATION AND DEVELOPMENT APPARATUS, A RESIST APPLICATION AND DEVELOPMENT METHOD, AND A RESIST FILM PROCESSING APPARATUS, CAPABLE OF FORMING A RESIST FILM WITH A LINE AND SPACE PATTERN

摘要

PURPOSE: A resist application and development apparatus, a resist application and development method, and a resist film processing apparatus are provided to reduce the roughness of a line width by smoothing a resist pattern.;CONSTITUTION: A cassette station(2) comprises a loading part(6), in which cassettes are loaded, and a wafer carrier(7). A wafer carrier transfers a wafer(W) between the cassettes and a processing station(3). A main transferring unit(13) is installed on the center of the processing station. Four processing groups are arranged around the main transferring unit. A third processing group(G3) is adjacently arranged to the cassette station. A fourth processing group(G4) adjacently arranged to an interface unit(4).;COPYRIGHT KIPO 2011