首页> 外国专利> Microwave-assisted magnetic recording structure, the magnetic random access memory structure, hard bias structure, method of manufacturing a perpendicular magnetic media and magnetic devices.

Microwave-assisted magnetic recording structure, the magnetic random access memory structure, hard bias structure, method of manufacturing a perpendicular magnetic media and magnetic devices.

机译:微波辅助磁记录结构,磁随机存取存储器结构,硬偏置结构,垂直磁介质的制造方法和磁性装置。

摘要

Perpendicular magnetic anisotropy and Hc are enhanced in magnetic devices with a Ta/M1/M2 seed layer where M1 is preferably Ti, and M2 is preferably Cu, and including an overlying (Co/Ni)X multilayer (x is 5 to 50) that is deposited with ultra high Ar pressure of 100 sccm to minimize impinging energy that could damage (Co/Ni)X interfaces. In one embodiment, the seed layer is subjected to one or both of a low power plasma treatment and natural oxidation process to form a more uniform interface with the (Co/Ni)X multilayer. Furthermore, an oxygen surfactant layer may be formed at one or more interfaces between adjoining (Co/Ni)X layers in the multilayer stack. Annealing at temperatures between 180° C. and 400° C. also increases Hc but the upper limit depends on whether the magnetic device is MAMR, MRAM, a hard bias structure, or a perpendicular magnetic medium.
机译:在具有Ta / M1 / M2种子层的磁性器件中,垂直磁各向异性和Hc增强,其中M1优选为Ti,M2优选为Cu,并包括上面的(Co / Ni)X多层膜(x为5至50),在大于100 sccm的超高Ar压力下沉积金属,以最小化可能损坏(Co / Ni)X界面的撞击能量。在一实施例中,对种子层进行低功率等离子体处理和自然氧化过程中的一者或两者,以与(Co / Ni)X多层形成更均匀的界面。此外,可以在多层堆叠中的相邻的(Co / Ni)X层之间的一个或多个界面处形成氧表面活性剂层。在180℃至400℃之间的温度下退火也增加了Hc,但是上限取决于磁性器件是MAMR,MRAM,硬偏置结构还是垂直磁性介质。

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