APPARATUS FOR MANAGING ETCHING SOLUTION, APPARATUS FOR MEASURING CONCENTRATION OF DISSOLVED METAL, AND METHOD FOR MEASURING CONCENTRATION OF DISSOLVED METAL

摘要

PROBLEM TO BE SOLVED: To provide an apparatus for managing an etching solution, which monitors a component concentration of an etching solution and a concentration of dissolved metal, automatically supplies a replenishment solution to control the component concentration to be constant, and separates and recovers the dissolved metal, an apparatus for measuring a concentration of dissolved metal, and a method for measuring a concentration of dissolved metal.SOLUTION: The apparatus for managing an etching solution includes: first physical property value measurement means for measuring a first physical property value correlating with a concentration of an acid in an etching solution; second physical property value measurement means for measuring a second physical property value correlating with a concentration of dissolved metal; replenishment solution feed and control means for controlling feeding of a replenishment solution to be supplied based on the correlation between the acid concentration and the first physical property value and on the measurement results of the first physical property value; and dissolved metal recovery and removal means for recovering and removing the dissolved metal based on the correlation between the concentration of the dissolved metal and the second physical property value and on the measurement results of the second physical property value.SELECTED DRAWING: Figure 1