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ETCH ING SOLUTION MANAGING APPARATUS, DISSOLVED METAL CONCENTRATION MEASURING APPA RATUS AND DISSOLVED METAL CONCENTRATION MEASURING METHOD
ETCH ING SOLUTION MANAGING APPARATUS, DISSOLVED METAL CONCENTRATION MEASURING APPA RATUS AND DISSOLVED METAL CONCENTRATION MEASURING METHOD
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机译:蚀刻溶液管理装置,溶解金属浓度测定装置及溶解金属浓度测定方法
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摘要
The present invention provides an etchant managing apparatus, a dissolved metal concentration measuring apparatus and a dissolved metal concentration measuring method which monitor dissolved metal concentration together with component concentration of an etchant, and supply a supplementary solution automatically to maintain the constant component concentration and collect the dissolved metal separately. The etchant managing apparatus comprises: a first physical property value measurement unit for measuring a first physical property value correlated with acid concentration in the etchant; a second physical property value measurement unit for measuring a second physical property value correlated with concentration of the dissolved metal; a supplementary solution delivery control unit for controlling delivery of the supplementary solution on the basis of correlation between the acid concentration and the first physical property value and the measurement result of the first physical property value; and a dissolved metal collection and removal unit for collecting and removing the dissolved metal on the basis of correlation between the concentration of the dissolved metal and the second physical property value.
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