Photomask, photomask set, exposure apparatus and exposure method

摘要

An exposure apparatus may include a first moving mechanism moving by driving a first drive source a first photomask; a second moving mechanism moving by driving a second drive source a second photomask; an imaging means for imaging a first alignment mark formed on the first photomask and a substrate side mark formed on the substrate and imaging a second alignment mark formed on the first photomask and a third alignment mark formed on the second photomask; and a control unit, wherein the control unit controls the first drive source so that alignment between the first alignment mark and the substrate side mark is performed based on results of imaging these marks, and the control unit controls the second drive source so that alignment between the second alignment mark and the third alignment mark is performed based on results of imaging these marks.