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Resistive random access memory (RRAM) cell with a composite capping layer

机译:具有复合覆盖层的电阻式随机存取存储器(RRAM)单元

摘要

A resistive random access memory (RRAM) cell with a composite capping layer is provided. A tantalum oxide based layer is arranged over a bottom electrode layer. The composite capping layer is arranged over and abutting the tantalum oxide based layer. The composite capping layer includes a first metal layer and a second metal layer overlying the first metal layer. The first metal layer is more reactive with the tantalum oxide based layer than the second metal layer. A top electrode layer is arranged over the composite capping layer. A method for manufacturing the RRAM cell is also provided.
机译:提供了具有复合覆盖层的电阻式随机存取存储器(RRAM)单元。基于氧化钽的层布置在底部电极层上方。复合覆盖层被布置在基于氧化钽的层上并与之邻接。复合覆盖层包括第一金属层和覆盖在第一金属层上的第二金属层。与第二金属层相比,第一金属层对基于氧化钽的层更具反应性。顶部电极层布置在复合覆盖层上方。还提供了一种用于制造RRAM单元的方法。

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