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METHOD OF PROVIDING INITIAL BIAS VALUE FOR OPTICAL PROXIMITY CORRECTION, AND MASK FABRICATING METHOD WITH OPTICAL PROXIMITY CORRECTION BASED ON THE INITIAL BIAS VALUE
METHOD OF PROVIDING INITIAL BIAS VALUE FOR OPTICAL PROXIMITY CORRECTION, AND MASK FABRICATING METHOD WITH OPTICAL PROXIMITY CORRECTION BASED ON THE INITIAL BIAS VALUE
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机译:提供用于光学邻近校正的初始偏差值的方法以及基于初始偏差值的具有光学邻近校正的掩码制造方法
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摘要
A method of fabricating a mask, the method including performing first optical proximity correction on first segments, obtaining a correspondence relationship between a feature of each of the first segments defined based on optical characteristics of a mask and an aperture and a bias value associated with each of the first segments, performing second optical proximity correction on second segments, and fabricating a mask based on a result of the second optical proximity correction. A feature of each of the second segments is obtained based on optical characteristics of a mask and the aperture. A bias value, that is obtained to correspond to the feature of each of the second segments based on the correspondence relationship, is allocated as an initial bias value to each of the second segments.
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