A mask blank having an actinic radiation-sensitive or radiation-sensitive resin composition, an actinic radiation or radiation-sensitive film, a light-actinic radiation-sensitive or radiation-sensitive film, a pattern forming method, and a manufacturing method of an electronic device

摘要

(A) in which the dissolution rate with respect to an alkali developing solution is lowered by the action of an acid, a compound having a group which is decomposed by the action of an alkali developing solution to increase the solubility in an alkali developing solution and has at least one of a fluorine atom and a silicon atom Sensitive active or radiation-sensitive resin composition containing a resin (B) and a resin (C) having a phenolic hydroxyl group different from the resin (B) An actinic ray-sensitive or radiation-sensitive film, and a mask blank, a method of forming a pattern using the actinic ray-sensitive or radiation-sensitive resin composition, and a method of manufacturing an electronic device.