A mask blank having an actinic radiation-sensitive or radiation-sensitive resin composition, an actinic radiation or radiation-sensitive film, a light-actinic radiation-sensitive or radiation-sensitive film, a pattern forming method, and a manufacturing method of an electronic device

摘要

According to the present invention, there is provided a photosensitive resin composition comprising a compound (A) whose dissolution rate with respect to an alkali developing solution is lowered by the action of an acid, a hydrophobic resin (B), and a resin (C) A film using the composition, a mask blank, a pattern forming method, and a manufacturing method of an electronic device are provided.