COMPOSITION DE MASQUE DUR, PROCÉDÉ DE FORMATION D'UN MOTIF UTILISANT LA COMPOSITION DE MASQUE DUR ET MASQUE DUR FORMÉ À PARTIR DE LA COMPOSITION DE MASQUE DUR

摘要

Provided are a hardmask composition and a method of forming a fine pattern using the hardmask composition, the hardmask composition including a solvent, a 2D carbon nanostructure (and/or a derivative thereof), and a 0D carbon nanostructure (and/or a derivative thereof).