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Spherical indentation of compound semiconductors

机译:化合物半导体的球形压痕

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Details of indentation-induced mechanical deformation of GaAs, InP and GaN have been studied. In particular, the origin of the discontinuities in the load-penetration curves during loading (so-called 'pop-in' events) was examined. Cross-sectional transmission electron microscopy (XTEM) samples of indents were prepared using focused-ton-beam milling. Atomic force microscopy (AFM) was used to examine the surface deformation after indentation. In all materials, slip appeared to be the prime mechanism of plastic deformation, and, in contrast with Si. no evidence of pressure-induced phase changes was found. Slip along the {111} planes is clearly observed by XTEM and AFM in both GaAs and InP following indentation above the 'pop-in' threshold. At high loads, subsurface median cracking is also revealed in these materials. This cracking appeared to be nucleated at the intersection of the slip planes. This suggests that dislocation pile-up at the slip band intersection and the consequential shear stress build-up cause the nucleation of a microcrack. In contrast, although slip is observed in GaN (predominantly along the basal planes parallel to the surface), no cracking or film delamination has been found. The difference between the crystallographic structures and dislocation densities of wurtzite GaN and cubic GaAs and InP can account for the different deformation modes. [References: 16]
机译:研究了压痕引起的GaAs,InP和GaN机械变形的细节。特别是,检查了荷载作用下荷载-渗透曲线中的不连续点(所谓的“弹入”事件)。压痕的横截面透射电子显微镜(XTEM)样品是使用聚焦吨束铣削制备的。原子力显微镜(AFM)用于检查压痕后的表面变形。在所有材料中,与Si相比,滑动似乎是塑性变形的主要机理。没有发现压力引起的相变的证据。通过XTEM和AFM在GaAs和InP中压入超过“弹出”阈值之后,可以清楚地观察到沿{111}平面的滑动。在高载荷下,这些材料还显示出地下正中裂纹。该裂纹似乎在滑动面的相交处成核。这表明在滑带相交处的位错堆积和随之产生的剪切应力的堆积导致了微裂纹的形核。相反,尽管在GaN中观察到打滑(主要沿平行于表面的基面),但未发现裂纹或膜层离。纤锌矿型GaN与立方GaAs和InP的晶体结构和位错密度之间的差异可以解释不同的变形模式。 [参考:16]

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