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首页> 外文期刊>Superconductor Science & Technology >Self-assembled CeO2 buffer layers on R-cut sapphire for high-current-density YBa2Cu3O7-delta films
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Self-assembled CeO2 buffer layers on R-cut sapphire for high-current-density YBa2Cu3O7-delta films

机译:R切割蓝宝石上的自组装CeO2缓冲层,用于高电流密度YBa2Cu3O7-δ膜

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摘要

Experimental evidence of a cooperative self-assembly process was obtained where high-temperature O-2 annealing (1000 degreesC) induced mass transport of CeO2 deposited on R-cut sapphire substrates to form a surface reconstruction on the substrate. When the CeO2 film exceeded a critical thickness (similar to10 nm), an atomically flat surface with a high density of nanodots was preferred by the reconstruction (revealed by scanning atomic force microscopy) and the CeO2 layers had high lattice and surface perfection (revealed by x-ray diffraction). YBa2Cu3O7-delta films grown on such CeO2-buffered sapphire substrates had a high transition temperature (T-c (p=o) > 90 K) and a high critical current density (J(c) > 3.0 x 10(6) A cm(-2) at 77.3 K and a zero applied magnetic field). [References: 18]
机译:获得了协作自组装过程的实验证据,其中高温O-2退火(1000摄氏度)诱导了沉积在R形切割蓝宝石衬底上的CeO2的质量迁移,从而在衬底上形成了表面重构。当CeO2薄膜超过临界厚度(大约10 nm)时,通过重建(通过扫描原子力显微镜揭示),优选具有高纳米点密度的原子平坦表面,并且CeO2层具有高晶格和表面完整性(通过X射线衍射)。在此类CeO2缓冲蓝宝石衬底上生长的YBa2Cu3O7-delta膜具有高转变温度(Tc(p = o)> 90 K)和高临界电流密度(J(c)> 3.0 x 10(6)A cm(- 2)在77.3 K和零磁场下)。 [参考:18]

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