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Effect of indium (III) content on photoelectrochemical performance of MoBi_(2-x)In_xS_5 thin films

机译:铟(III)含量对MoBi_(2-x)In_xS_5薄膜的光电化学性能的影响

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摘要

Highly ordered quaternary semiconducting MoBi_(2-x))In_xS_5 nanocrystalline thin films have been successfully synthesized via a relatively simple and convenient Arrested Precipitation Technique (APT). This solution based technique is being scaled up and may serve as the basis for the next generation of low cost solar cells. Depending on the chemical composition and synthesis conditions, the morphology of the nanocrystalline thin films can be controlled by [In]/[Bi] molar ratio. The structural, morphological, compositional and optical absorption properties of as-synthesized MoBi_(2-x)In_xS_5 thin films are characterized using X-ray diffraction (XRD), high resolution transmission electron microscope (HRTEM), scanning electron microscope (SEM), field emission scanning electron microscope (FESEM), energy dispersive X-ray spectroscopy (EDS), X-ray photoelectron spectroscopy (XPS) and UV-Vis-NIR spectrophotometry techniques. The photoelectrochemical (PEC) characterization of the films were carried out in 0.05 M I~-/I_3 redox electrolyte under dark and illuminated conditions. The maximum photocurrent density (411 μA/cm~2) is obtained for molar ratio [In]/[Bi] = 1 using 500 W tungsten filament lamp with light intensity 30 mW/cm~2.
机译:高阶四元半导MoBi_(2-x)In_xS_5纳米晶薄膜已通过相对简单便捷的捕集沉淀技术(APT)成功合成。这种基于解决方案的技术正在按比例扩大,并且可以用作下一代低成本太阳能电池的基础。取决于化学组成和合成条件,可以通过[In] / [Bi]摩尔比控制纳米晶薄膜的形态。使用X射线衍射(XRD),高分辨率透射电子显微镜(HRTEM),扫描电子显微镜(SEM)对合成的MoBi_(2-x)In_xS_5薄膜的结构,形态,组成和光学吸收性能进行了表征场发射扫描电子显微镜(FESEM),能量色散X射线光谱仪(EDS),X射线光电子光谱仪(XPS)和UV-Vis-NIR分光光度法技术。在黑暗和光照条件下,在0.05 M I〜-/ I_3氧化还原电解质中对薄膜进行光电化学(PEC)表征。当摩尔比[In] / [Bi] = 1时,使用光强度为30 mW / cm〜2的500 W钨丝灯,可获得最大光电流密度(411μA/ cm〜2)。

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