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首页> 外文期刊>Microwave and optical technology letters >X-BAND MMIC LOW-NOISE AMPLIFIER MMIC ON SiC SUBSTRATE USING 0.25-μm ALGaN/GaN HEMT TECHNOLOGY
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X-BAND MMIC LOW-NOISE AMPLIFIER MMIC ON SiC SUBSTRATE USING 0.25-μm ALGaN/GaN HEMT TECHNOLOGY

机译:使用0.25μmALGaN / GaN HEMT技术在SiC衬底上的X波段MMIC低噪声放大器MMIC

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摘要

In this article, we demonstrate a 9.7-12.9-GHz monolithic microwave integrated circuit low-noise amplifier (LNA) designed and fabricated using a AlGaN/GaN 0.25-μm high-electron mobility transistor on silicon carbide (SiC) technology. Microstriplines are used for matching circuits, except for the MIM capacitors acting as DC blocks in the matching circuits of the LNA circuit. The matching and bias circuits of the LNA are merged and meandered to simplify the structure of the amplifier and reduce the chip size. The LNA shows a noise figure of 1.7-2.1 dB with a small-signal gain of 20-26 dB and an isolation of 45-52 dB across the 9.7-12.9 GHz frequency range. Under continuous wave conditions, a saturated output power of 34 dBm is shown at 11.2 GHz, and an output third-order intercept point of 42 dBm is also achieved at 11.4 GHz.
机译:在本文中,我们演示了使用碳化硅(SiC)技术上的AlGaN / GaN 0.25μm高电子迁移率晶体管设计和制造的9.7-12.9-GHz单片微波集成电路低噪声放大器(LNA)。微带线用于匹配电路,除了LNA电路的匹配电路中用作直流模块的MIM电容器外。 LNA的匹配电路和偏置电路被合并并蜿蜒曲折,以简化放大器的结构并减小芯片尺寸。 LNA在9.7-12.9 GHz频率范围内的噪声系数为1.7-2.1 dB,小信号增益为20-26 dB,隔离度为45-52 dB。在连续波条件下,在11.2 GHz处显示的饱和输出功率为34 dBm,在11.4 GHz处也达到42 dBm的输出三阶交调点。

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