The drive towards dry vacuum pumping has occurred across the spectrum of vacuum applications from semiconductor manufacture to industrial processing. This brings with it a need to systematically evaluate and quantify the degree of cleanliness characteristic of any particular pump; currently, there is no universally accepted method to perform this function. A methodology developed for repeatable measurements of pump cleanliness will be discussed. It utilizes residual gas analysis with carefully controlled pump conditions. This facilitates direct comparisons of the degree of cleanliness between pumps of the same and those of different design. Additionally, it allows for the assessment of methods (either in pump design or use) introduced to improve cleanliness.
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