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Structure-Property Relationships in Epitaxial, Low Loss SrTiO_3 Thin Films

机译:外延低损耗SrTiO_3薄膜的结构-性能关系

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摘要

Epitaxial thin films of Au/SrTiO_3 (001)/SrRuO_3 heterostructures were deposited by Pulsed Laser Ablation. The thickness of the bottom electrode, SrRuO_3 (SRO) was varied from 500 A to 5000 A, with the aim of studying the dependence of dielectric properties of the STO films on the buffer layer thickness. It would appear that the strains introduced during the high temperature deposition of these films have a profound influence on the dielectric behavior. These effects are observed in the form of peaks in the loss curves. The results of dielectric measurements are correlated to the strain in the films. This paper also reports the results of tunability and these were found to be very encouraging.
机译:通过脉冲激光烧蚀沉积Au / SrTiO_3(001)/ SrRuO_3异质结构的外延薄膜。底部电极的厚度SrRuO_3(SRO)在500 A至5000 A之间变化,目的是研究STO膜的介电性能对缓冲层厚度的依赖性。似乎在这些膜的高温沉积过程中引入的应变对介电性能具有深远的影响。这些效应以损耗曲线中的峰值形式出现。介电测量的结果与薄膜中的应变相关。本文还报告了可调性的结果,发现这些结果非常令人鼓舞。

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