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首页> 外文期刊>Integrated Ferroelectrics >Influence of SrTiO_3 Buffer Layer on the Ferroelectric Properties of Bi_2NiMnO_6 Thin Film
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Influence of SrTiO_3 Buffer Layer on the Ferroelectric Properties of Bi_2NiMnO_6 Thin Film

机译:SrTiO_3缓冲层对Bi_2NiMnO_6薄膜铁电性能的影响

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摘要

Double perovskite Bi_2NiMnO_6 (BNMO) thin films with and without SrTiO_3 (STO) buffer layer have been prepared on Pt (111)/Ti/SiO_2/Si(100) substrates by a chemical solution deposition method. The microscopic surface morphology, ferroelectric, and leakage current have been investigated. It is shown that the STO buffer layer can improve the remnant polarization slightly, and reduce the coercive electric field from 100 to 36 kV/cm. When the positive voltage was applied on top Au electrode of the BNMO/STO/Pt thin film capacitors, the leakage current was controlled by ohmic conduction. When the negative voltage was applied on bottom Pt electron, the leakage current of BNMO/STO thin film was limited by the traps and the density of carriers at high electric field.
机译:通过化学溶液沉积法在Pt(111)/ Ti / SiO_2 / Si(100)衬底上制备了具有和不具有SrTiO_3(STO)缓冲层的双层钙钛矿Bi_2NiMnO_6(BNMO)薄膜。已经研究了微观表面形态,铁电和泄漏电流。结果表明,STO缓冲层可以稍微改善残余极化,并将矫顽电场从100 kV / cm降低到36 kV / cm。当在BNMO / STO / Pt薄膜电容器的顶部Au电极上施加正电压时,通过欧姆传导控制泄漏电流。当在底部Pt电子上施加负电压时,BNMO / STO薄膜的泄漏电流受到陷阱和高电场中载流子密度的限制。

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