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Terahertz absorption in AlGaAs films and detection using heterojunctions

机译:AlGaAs薄膜中的太赫兹吸收和异质结检测

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HEterojunction Interfacial Workfunction Internal Photoemission (HEIWIP) detectors using AlGaAs as both the emitter and the barrier material with different Al fractions for the two layers are demonstrated. The extension of the HEIWIP concept to wavelengths longer than 110 mu m in the GaAs/AlGaAs system requires the use of AlGaAs as the emitter material to reduce the barrier height. The p-type doping produces an offset in the valance band between doped and undoped material. The Al fraction difference then gives a valance band offset in the opposite direction, which reduces the total offset. The FIR absorption up to similar to 400 mu m for AlGaAs films with different Al fractions and doping are presented. The absorption in the films with low Al fraction (1%) shows little variation from comparable GaAs films while for 20% Al, the absorption is reduced. The spectral results on a device with 12% Al emitters and 11% Al barriers have shown a response of 0.6 A/W at 30 mu m with D* = 3 x 10(10) Jones measured at 5 K. The low responsivity is due to the reduced number (3) of emitters in the test device, and when scaled for the number of emitters this is comparable to results obtained from GaAs/AlGaAs HEIWIP detectors. Based on these results, a design for a 300 mu m detector is presented and potential difficulties in growth and fabrication such as dopant migration are discussed. (c) 2005 Elsevier B.V. All rights reserved.
机译:展示了使用AlGaAs作为两层的Al含量不同的发射极和势垒材料的异质结界面功函数内部光发射(HEIWIP)检测器。要在GaAs / AlGaAs系统中将HEIWIP概念扩展到波长大于110微米,就需要使用AlGaAs作为发射极材料以减小势垒高度。 p型掺杂会在掺杂材料和未掺杂材料之间在价带中产生偏移。 Al分数差于是在相反方向上给出价带偏移,这减小了总偏移。提出了具有不同Al分数和掺杂的AlGaAs薄膜的FIR吸收可达400微米。低铝含量(1%)的薄膜中的吸收与可比的砷化镓薄膜相比几乎没有变化,而对于20%的铝,吸收降低。在具有12%Al发射器和11%Al势垒的设备上的光谱结果显示,在30 µm处,在5 K下测得的D * = 3 x 10(10)Jones,响应为0.6 A / W。减少了测试设备中发射器的数量(3),并且按发射器的数量进行缩放时,这与从GaAs / AlGaAs HEIWIP检测器获得的结果相当。基于这些结果,提出了一种300μm检测器的设计,并讨论了生长和制造过程中的潜在困难,例如掺杂剂迁移。 (c)2005 Elsevier B.V.保留所有权利。

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