首页> 外文期刊>Электронная Обработка Материалов >Electrolytic-plasma polishing of copper and its alloys
【24h】

Electrolytic-plasma polishing of copper and its alloys

机译:电解质 - 铜及其合金的电解质抛光

获取原文
获取原文并翻译 | 示例
           

摘要

The behavior of copper and its alloys (brass and nickel silver) was analysed in diluting solutions of some salt with anodic polarisation in wide region of voltage (from 0 to 420 V). The region of voltage corresponding to electrode surface dissolution, to oxide film formation or to salts films formation, gaseous vapour envelope formation were investigated. The influence of anode material on electrode process is investigated. It was shown that the process of anode dissolution is the main thing in the voltages region of stable gaseous vapour envelope. Anomalous high meaning of current efficiency process dissolution in some conditions were found. Positive and negative sites of using complex mg agent were marked. Optimal compositions of electrolytes and parameters for polishing of investigative materials were suggested。
机译:分析铜及其合金(黄铜和镍银)在宽电压区域(0至420V)中稀释阳极偏振的阳极偏振的溶液稀释溶液。 研究了对应于电极表面溶解的电压区域,对氧化物膜形成或盐膜形成,气态蒸气包络形成。 研究了阳极材料对电极工艺的影响。 结果表明,阳极溶解的过程是稳定气态蒸气封套的电压区域中的主要物质。 发现了在某些条件下电流效率过程溶解的异常高意义。 使用复杂Mg试剂的正面和阴性位点被标记。 提出了电解质的最佳组合物和用于调查材料抛光的参数。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号