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Electrolytic-plasma polishing of copper and its alloys

机译:铜及其合金的电解等离子抛光

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The behavior of copper and its alloys (brass and nickel silver) was analysed in diluting solutions of some salt with anodic polarisation in wide region of voltage (from 0 to 420 V). The region of voltage corresponding to electrode surface dissolution, to oxide film formation or to salts films formation, gaseous vapour envelope formation were investigated. The influence of anode material on electrode process is investigated. It was shown that the process of anode dissolution is the main thing in the voltages region of stable gaseous vapour envelope. Anomalous high meaning of current efficiency process dissolution in some conditions were found. Positive and negative sites of using complex mg agent were marked. Optimal compositions of electrolytes and parameters for polishing of investigative materials were suggested。
机译:分析了铜及其合金(黄铜和镍银)在宽电压范围(0至420 V)中的一些具有阳极极化的盐的稀释溶液中的行为。研究了与电极表面溶解,氧化膜形成或盐膜形成,气态蒸气包膜形成相对应的电压区域。研究了阳极材料对电极工艺的影响。结果表明,在稳定的气态蒸气包络线的电压范围内,阳极溶解过程是最主要的过程。发现在某些条件下电流效率过程溶解的异常高含义。标记了使用复合mg剂的阳性和阴性部位。提出了最佳的电解质成分和研究材料的抛光参数。

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