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Fabrication of Thiol-Ene 'Clickable' Copolymer-Brush Nanostructures on Polymeric Substrates via Extreme Ultraviolet Interference Lithography

机译:通过极紫外干涉光刻技术在聚合物基材上制备硫醇-烯“可点击”共聚物-刷纳米结构

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We demonstrate a new approach to grafting thiol-reactive nanopatterned copolymer-brush structures on polymeric substrates by means of extreme ultraviolet (EUV) interference lithography. The copolymer brushes were designed to contain maleimide functional groups as thiol-reactive centers. Fluoropolymer films were exposed to EUV radiation at the X-ray interference lithography beamline (XIL-II) at the Swiss Light Source, in order to create radical patterns on their surfaces. The radicals served as initiators for the copolymerization of thiol-ene "clickable" brushes, composed of a furan-protected maleimide monomer (FuMaMA) and different methacrylates, namely, methyl methacrylate (MMA), ethylene glycol methyl ether methacrylate (EGMA), or poly(ethylene glycol) methyl ether methacrylate (PEGMA). Copolymerization with ethylene-glycol-containing monomers provides antibiofouling properties to these surfaces. The number of reactive centers on the grafted brush structures can be tailored by varying the monomer ratios in the feed. Grafted copolymers were characterized by using attenuated total reflection infrared (ATR-IR) spectroscopy. The reactive maleimide methacrylate (MaMA) units were utilized to conjugate thiol-containing moieties using the nucleophilic Michael-addition reaction, which proceeds at room temperature without the need for any metal-based catalyst. Using this approach, a variety of functionalities was introduced to yield polyelectrolytes, as well as fluorescent and light-responsive polymer-brush structures. Functionalization of the brush structures was demonstrated via ATR-IR and UV-vis spectroscopy and fluorescence microscopy, and was also indicated by a color switch. Furthermore, grafted surfaces were generated via plasma activation, showing a strongly increased wettability for polyelectrolytes and a reversible switch in static water contact angle (CA) of up to 18 degrees for P(EGMA-co-MaMA-SP) brushes, upon exposure to alternating visible and UV-light irradiation.
机译:我们展示了一种通过极紫外(EUV)干涉光刻技术在聚合物基材上接枝硫醇反应性纳米图案化共聚物-刷结构的新方法。共聚物刷被设计为包含马来酰亚胺官能团作为硫醇反应中心。含氟聚合物薄膜在瑞士光源的X射线干涉光刻光束线(XIL-II)下暴露于EUV辐射,以在其表面上产生自由基图案。自由基用作硫醇-烯“可点击”刷的共聚引发剂,该刷由呋喃保护的马来酰亚胺单体(FuMaMA)和不同的甲基丙烯酸酯组成,即甲基丙烯酸甲酯(MMA),乙二醇甲基醚甲基丙烯酸甲酯(EGMA)或聚(乙二醇)甲基醚甲基丙烯酸酯(PEGMA)。与含乙二醇单体的共聚为这些表面提供了抗生物污垢特性。可以通过改变进料中的单体比例来调整接枝刷结构上反应中心的数量。通过使用衰减全反射红外(ATR-IR)光谱对接枝共聚物进行了表征。反应性马来酰亚胺甲基丙烯酸酯(MaMA)单元通过亲核迈克尔加成反应用于共轭含硫醇的部分,该反应在室温下进行,不需要任何金属基催化剂。使用这种方法,引入了多种功能以产生聚电解质以及荧光和光响应聚合物刷结构。刷子结构的功能化通过ATR-IR和UV-vis光谱学和荧光显微镜证实,并且还通过颜色开关指示。此外,接枝表面是通过等离子活化产生的,在暴露于P(EGMA-co-MaMA-SP)刷子时,聚电解质的润湿性大大提高,静态水接触角(CA)的可逆转换高达18度。可见光和紫外线交替照射。

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