...
首页> 外文期刊>Journal of Advanced Manufacturing Systems >Copper Electroforming Optimization for Fused Deposition Modeling Produced ABS Components for Indirect Tooling Applications
【24h】

Copper Electroforming Optimization for Fused Deposition Modeling Produced ABS Components for Indirect Tooling Applications

机译:用于间接工具应用的融合沉积建模的铜电铸优化模拟生产ABS组件

获取原文
获取原文并翻译 | 示例
           

摘要

The market trends from last few decades have increased the pressure on development of the new products in minimum time. This can be supplemented with modification in the manufacturing processes for product development. Since last two decades, additive manufacturing (AM) also known as rapid prototyping has been used to produce components. The present work aims at optimization of thickness of deposition and surface finish of copper on Acrylonitrile Butadiene Styrene (ABS) components produced by Fused Deposition Modeling (FDM), which can be used for indirect tooling. The different process parameters such as Voltage, Concentration of Copper sulfate Solution (CSS) and deposition time are optimized. The experiment reveals that the best process parameters for maximum deposition rate gives a deposition rate of 0.19 mm/h. The surface roughness is found to be minimum at the lower values of the process parameters as 1.87 mu m. It has been observed that voltage (43.2%) and concentration of CSS (48.8%) significantly affect the deposition rate and for surface finish the concentration of CSS (69.59%) is the major contributor. The microstructurestudy of the deposited copper reveals a variation in the grain size from coarse to fine as the thickness of the deposited layer increases. study of the deposited copper reveals a variation in the grain size from coarse to fine as the thickness of the deposited layer increases.
机译:过去几十年的市场趋势在最短的时间内增加了新产品开发的压力。这可以补充在产品开发过程中的修改。自从过去二十年以来,也已被称为快速原型的添加剂制造(AM)用于生产组件。本作者的目的是通过熔融沉积建模(FDM)生产的丙烯腈丁二烯苯乙烯(ABS)组分的铜沉积和表面光洁度的优化,其可用于间接工具。优化了不同工艺参数,例如电压,硫酸铜溶液(CSS)和沉积时间的浓度。实验表明,最大沉积速率的最佳工艺参数给出0.19mm / h的沉积速率。发现表面粗糙度在工艺参数的较低值为1.87μm的较低值下最小。已经观察到,电压(43.2%)和Css的浓度(48.8%)显着影响沉积速率和表面处理的浓度(69.59%)是主要的贡献者。随着沉积层的厚度增加,沉积铜的微观结构揭示了从粗粗尺寸的变化。随着沉积层的厚度增加,沉积铜的研究揭示了从粗糙到精细的晶粒尺寸的变化。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号