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CVD diamond growth from nanodiamond seeds buried under a thin chromium layer

机译:CVD金刚石生长从薄铬层埋在薄铬层下

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This work presents a morphological and structural analysis of CVD diamond growth on silicon from nanodiamond seeds covered by a 50 nm thick chromium layer. The role of carbon diffusion as well as chromium and carbon silicide formation is analyzed. The local diamond environment is investigated by scanning transmission electron microscopy in combination with electron energy-loss spectroscopy. The evolution of the diamond phase composition (sp(3)/sp(2)) is evaluated by micro-Raman spectroscopy. Raman and X-ray diffraction analysis are used to identify the interfacial phases formed during CVD growth. Based upon the observed morphological and structural evolution, a diamond growth model from nanodiamond seeds buried beneath a thin Cr layer is proposed. (C) 2016 Elsevier B.V. All rights reserved.
机译:该工作介绍了由50nm厚的铬层覆盖的纳米胺种子硅的CVD金刚石生长的形态和结构分析。 分析了碳扩散以及铬和碳硅化物形成的作用。 通过扫描透射电子显微镜与电子能损光谱相结合来研究局部金刚石环境。 通过微拉曼光谱法评估金刚石相组合物(SP(3)/ SP(2))的演变。 拉曼和X射线衍射分析用于鉴定CVD生长期间形成的界面相。 基于观察到的形态和结构演化,提出了埋在薄CR层下方的纳米胺种子的金刚石生长模型。 (c)2016年Elsevier B.v.保留所有权利。

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