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首页> 外文期刊>International journal of nanoscience >Optical Analysis of Iron-Doped Lead Sulfide Thin Films for Opto-Electronic Applications
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Optical Analysis of Iron-Doped Lead Sulfide Thin Films for Opto-Electronic Applications

机译:光电应用铁掺杂铁硫化铅薄膜的光学分析

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Iron-doped lead sulfide thin films were deposited on glass substrates using successive ionic layer adsorption and reaction method (SILAR) at room temperature. The X-ray diffraction pattern of the film shows a well formed crystalline thin film with face-centered cubic structure along the preferential orientation (1 1 1). The lattice constant is determined using Nelson Riley plots. Using X-ray broadening, the crystallite size is determined by Scherrer formula. Morphology of the thin film was studied using a scanning electron microscope. The optical properties of the film were investigated using a UV–vis spectrophotometer. We observed an increase in the optical band gap from 2.45 to 3.03eV after doping iron in the lead sulfide thin film. The cutoff wavelength lies in the visible region, and hence the grown thin films can be used for optoelectronic and sensor applications. The results from the photoluminescence study show the emission at 500–720nm. The vibrating sample magnetometer measurements confirmed that the lead sulfide thin film becomes weakly ferromagnetic material after doping with iron.
机译:在室温下使用连续的离子层吸附和反应方法(Sill)在玻璃基板上沉积铁掺杂的硫化物薄膜。薄膜的X射线衍射图案显示良好形成的结晶薄膜,沿着优先取向(111)具有面向中心的立方结构。使用纳尔逊莱利图确定晶格常数。采用X射线宽度,微晶尺寸由Scherrer公式确定。使用扫描电子显微镜研究薄膜的形态。使用UV-Vis分光光度计研究膜的光学性质。在掺杂铁硫化物薄膜中,我们观察到从2.45到3.03EV的光学带隙的增加。截止波长位于可见区域中,因此生长的薄膜可用于光电和传感器应用。光致发光研究的结果显示500-720nm的发射。振动样品磁力计测量结果证实,铅硫化物薄膜在用铁掺杂后变得弱铁磁性材料。

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