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Effects of terminated atoms, porosity and drilling orientations on the band structure of porous silicon

机译:终止原子,孔隙率和钻井取向对多孔硅带结构的影响

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摘要

We designed different models of nano porous silicon terminated by hydrogen or oxygen atoms, and analyzed their band gap structure and density of states by means of first-principles density functional theory calculation. For the hydrogen-atom-passivation porous silicon in the [100] direction, with the increase of porosity, the band gap increased. When the porosity is 64%, a direct band gap is obtained. The theoretical results were confirmed by our experiments. For the oxygen-atom-passivation porous silicon in the [100] direction, half-metallic behavior and ferromagnetism appear when the porosity is 64%, which is due to the Si 3p band affected by O 2p and H 1s orbitals. For the oxygen-atom-passivation porous silicon in the [1 1 0] direction, a direct band gap occurs when the porosity is 49%. Passivation atom, porosity and hollowed-out direction are key factors affecting the band gap structure and density of states of porous silicon. These results would have significant impacts on design of complex porous silicon structures for silicon band-gap engineering in the area of optoelectronics. (C) 2017 Elsevier B.V. All rights reserved.
机译:我们设计了由氢气或氧原子终止的纳米多孔硅的不同型号,并通过第一原理密度泛函理论计算分析它们的带隙结构和密度。对于[100]方向上的氢原子钝化多孔硅,随着孔隙率的增加,带隙的增加。当孔隙率为64%时,获得直接带隙。我们的实验证实了理论结果。对于[100]方向上的氧原子钝化多孔硅,当孔隙率为64%时,出现半金属行为和铁磁性,这是由于受O 2P和H 1S轨道影响的Si 3P带。对于[110]方向上的氧原子钝化多孔硅,当孔隙率为49%时发生直接带隙。钝化原子,孔隙率和挖空方向是影响多孔硅的带隙结构和密度的关键因素。这些结果将对光电子区域的硅带隙工程的复杂多孔硅结构设计产生重大影响。 (c)2017 Elsevier B.v.保留所有权利。

著录项

  • 来源
    《Computational Materials Science》 |2017年第2017期|共7页
  • 作者单位

    Hebei Normal Univ Dept Phys Hebei Adv Thin Films Lab Shijiazhuang 050024 Peoples R China;

    Hebei Normal Univ Dept Phys Hebei Adv Thin Films Lab Shijiazhuang 050024 Peoples R China;

    Hebei Normal Univ Dept Phys Hebei Adv Thin Films Lab Shijiazhuang 050024 Peoples R China;

    Hebei Normal Univ Dept Phys Hebei Adv Thin Films Lab Shijiazhuang 050024 Peoples R China;

    Shijiazhuang Tiedao Univ Dept Math &

    Phys Shijiazhuang 050043 Peoples R China;

    Hebei Normal Univ Dept Phys Hebei Adv Thin Films Lab Shijiazhuang 050024 Peoples R China;

    Hebei Normal Univ Dept Phys Hebei Adv Thin Films Lab Shijiazhuang 050024 Peoples R China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;
  • 关键词

    Porous silicon; Surface passivation; First-principles calculation; Porosity; Orientation;

    机译:多孔硅;表面钝化;第一原理计算;孔隙度;方向;

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