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首页> 外文期刊>Current opinion in solid state & materials science >Tuning exchange bias in epitaxial Ni/MgO/TiN heterostructures integrated on Si(100)
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Tuning exchange bias in epitaxial Ni/MgO/TiN heterostructures integrated on Si(100)

机译:Si(100)上集成的外延Ni / MgO / TiN异质结构中的调谐交换偏压

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摘要

Epitaxial Ni thin films are integrated with tunneling barrier MgO on Si(100) substrate. During pulsed laser deposition, early island-like structure transformed into uniform thin film with increasing number of laser pulses. This led to transitions in exchange bias from positive to negative and back to positive, which is ascribed to morphology associated residual strain. The Ni island structure has a coercive field as high as 3 times of that of the continuous film. The current work holds a tremendous promise in the realization of magnetic devices integrated with the Si-platform.
机译:外延Ni薄膜与Si(100)衬底上的隧穿势垒MgO集成在一起。在脉冲激光沉积过程中,随着激光脉冲数量的增加,早期的岛状结构转变为均匀的薄膜。这导致交换偏向从正变负,再变回正,这归因于形态相关的残余应变。镍岛结构的矫顽场高达连续膜的3倍。当前的工作在实现与Si平台集成的磁性设备方面具有广阔的前景。

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